【摘要】 本文介绍用直流磁控S枪在H₂/Ar混合气体中反应溅射单晶硅靶淀积a-Si:H光电导薄膜的制备工艺。研究了用这种技术制备的a-Si:H薄膜的光学特性（透射率光谱、光学常数和光学带隙等）、晶相结构（用电子衍射图谱）、红外吸收光谱和光电导性能。并讨论了制备工艺条件与薄膜微结构和性能的关系。更多还原

【Abstract】 The preparation and sputtering characteristics of hydrogenated amorphous silicon（a-Si: H） by DC S-gun magnetron sputtering of a monocrystalline silicon target in H₂/Ar plasma （reactive sputtering） have been studied. Optical properties including transmission spectra, optical constants and optical band gap, crystalline structure, infrared spectrometry and photoconductivity of the films deposited by S-gun magnetron sputtering were measured and studied. The dependence of the microstructure and properties of a-Si: H films on the deposition. conditions has also been discussed.更多还原