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InSb电荷注入成像阵列
InSb Charge-Injection Imaging Array Technology
【摘要】 采用InSb MIS技术已成功研制出线列和面阵型自扫描3～5μm红外焦平面器件。本文介绍了InSb MIS结构理论和界面电学特性分析;结构设计和工艺实现途径。介绍了器件性能结果。
【Abstract】 Both linear and area IRFPA have been fabricated successfully based on InSb MIS technology. InSb MIS construction theory interface Characteristics, device design sad fabrications are briefly reviewed tn this paper. The performance results are also presented.
- 【文献出处】 激光与红外 ,Laser & Infrared , 编辑部邮箱 ,1992年04期
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