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化学镀Ni—P工艺及镀层组织结构的研究

Ni-P Deposition Technology and the Structure in Ni-P

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【作者】 张宇东王少曼阎大京王洪顺

【Author】 Zhang Yudong et al

【机构】 沈阳航空工业学院沈阳航空工业学院

【摘要】 本文选用了三种配方的镀液进行化学镀Ni—P的研究。确定出最佳镀液及施镀工艺参数,并对镀层的成分和结构进行了测定和分析。结果表明,镀层具有较高的硬度值(HV800~824),其中含磷量沿镀层纵、横两向分布基本均匀。

【Abstract】 Three kinds of solutions were applied to deposite Ni-P alloy electrolessly. The optimum one and its techonogical parameters were determined,and compositions and structures of the deposited Ni-P plating were also measured and analyzed in the paper. Results showed that the structure of the deposited plating was amorphous with a hardness of HV 800 ~824. Its P contents along both longitudinal and transverse directions were roughly uniform .

【关键词】 化学镀Ni—P合金非晶态
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