节点文献
硅基底薄膜波导在VLSI光互连中的应用研究
The Research on the Application of Si-Based Film Waveguides to Optical Interconnection in VLSI
【摘要】 首次研究了用PECVD方法制作的氮氧化硅光波导在超大规模集成电路光互连中的应用。以光致抗蚀剂波导为例,初步探讨了有机物和聚合物在光互连中的应用前景,并指出了现存问题及发展方向。
【Abstract】 The silicon oxynitride waveguides made with PECVD method was applied to guided- wave optical interconnection in VLSI. The KPR (Kodak photoresist) material was used to inquire into the application of nonlinear organic materials and polymers to optical interconnections. The existing problems in technological process and the approaches to deal with them were also discussed.
【关键词】 硅基底;
光波导;
光互连;
超大规模集成电路;
【Key words】 Si matrix; Optical waveguide; Optical interconnection; VLSI;
【Key words】 Si matrix; Optical waveguide; Optical interconnection; VLSI;
【基金】 863计划资助课题
- 【文献出处】 高技术通讯 ,High Technology Letters , 编辑部邮箱 ,1992年06期
- 【分类号】TN47
- 【被引频次】1
- 【下载频次】11