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真空阴极电弧沉积 TiN 装饰膜工艺与应用研究

THE PROCESS AND APPLICATION OF TiN DECORATIVE FILMS FORMED BY VACUUM CATHODIC ARC DEPOSITION

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【作者】 袁镇海戴达煌罗广南谢致薇

【Author】 YUAN Zhenhai DAI Dahuang LUO Guangzhou Research Institute of Non-Ferrous Metals,Guangzhou 510651

【机构】 广州有色金属研究院广州有色金属研究院 广州(510651)广州(510651)

【摘要】 本文研究了真空阴极电弧沉积 TiN 装饰膜的工艺及其应用.利用 X 射线衍射、扫描电镜等方法,分析了膜层性能与沉积工艺之间的关系,结果表明:(1)适当增大气氛压力,可减少 Ti 液滴,从而提高了膜层的显微硬度和耐腐蚀性能;(2)膜层颜色与负偏压和氮分压有关.本文报导了工艺参数对膜层织构和品格畸变的影响.本文还对表壳、表带、餐具.陶瓷制品仿金镀等应用问题进行了讨论.

【Abstract】 In this paper,the process and application of TiN decorative films formed by vacuum cathodic are deposition are investigated.The relation between pro- perties of TiN films and deposition technology are also analyzed using X-ray dif- fraction, scanning electron microscope,etc.Results show that (1) When the atmosphe- tic pressure was properly raised,droplets Were reduced in size and amount;therefore, both microhardness and corrosion resistance of the films were improved; (2) The color of the films had relations to negative bias and N2 pressure.Moreover,influence of technological parameters on the texture and the lattice distortion are reported and the application of decorative films to watchcases,watchbands,tableware and ceramics are discussed.

  • 【文献出处】 广东有色金属学报 ,Journal of Guangdong Non-ferrous Metals , 编辑部邮箱 ,1992年02期
  • 【被引频次】2
  • 【下载频次】80
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