【摘要】 用双离子束溅射淀积法,在轰击源含不同 CH₄流量比的条件下,于玻璃和 Si 基片上淀积了DLC 薄膜。用多种手段对所制备的膜进行了结构表征和性能分析。结果表明,轰击源中 CH₄流量比对DLC 膜的结构、形貌及其光、电性能有重要的影响。分析了影响机制,探讨了 DLC 膜的生长机理。更多还原

【Abstract】 Using dual-ion beam sputtering deposition method,DLC films were depositedon glass and silicon substrate under different CH₄ flow ratios（CH₄/（CH₄+Ar）from 0% to100%）in bombarding ion source.The structures and the properties of the films were systemati-cally analyzed.It showed that the structures,the morphological characteristics and the proper-ties of the films were strongly influenced by the CH₄ flow ratios.The formation mechanism ofDLC films were investigated.更多还原