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不连续类氧化层界面多晶硅发射极晶体管理论模型

A Discontinuous Oxide-Like Interface Theory Model of Polysilicon Emitter Transistor

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【作者】 魏希文李建军马平西邹赫麟王阳元张利春吉利久

【Author】 Wei Xiwen/Physics Department Dalian University of Technology,Dalian,116023Li Jianjun/Physics Department Dalian University of Technology,Dalian,116023Ma Pingxi/Physics Department Dalian University of Technology,Dalian,116023Zou Helin/Physics Department Dalian University of Technology,Dalian,116023Wang Yangyuan/Institute of Microelectronics.Peking University, Beijing,100871Zhang Lichun/Institute of Microelectronics.Peking University, Beijing,100871Ji Lijiu/Institute of Microelectronics.Peking University, Beijing,100871

【机构】 大连理工大学半导体研究室北京大学徽电子研究所北京大学徽电子研究所 大连116023大连116023北京100871北京100871

【摘要】 本文提出了一个不连续类氧化层界面多晶硅发射极晶体管理论模型,根据多晶/单晶硅界面的性质空穴分别以隧道方式或热发射方式通过界面的不同部位.计算机模拟的结果得到了类氧化层界面的连续性、多晶硅膜厚、类氧化层两边的界面态密度、类氧化层厚度和多晶/单晶硅界面杂质浓度峰值等参数与多晶硅发射极晶体管(PET)电学特性的关系.

【Abstract】 A discontinuous oxide-like interface theory model of polysilicon emitter transistor (PET) isproposed. According to the characters of the polysilicon-monosilicon interface, holes pass throu-gh the different parts of the interface by tunneling or thermionic.emission. It is obtained byusing the computer simulation that the electronic characterics of the PET depend on the interfacecontinuity, polysilicon thickness, interface state density, continuous oxide-like layer thickness andthe maximum dopant concentration at the interface.

  • 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1992年09期
  • 【被引频次】5
  • 【下载频次】43
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