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Ar~+激光结晶非晶硅膜电学性质研究
Study on Electrical properties of Ar~+ Laser Crystallized a-Si:H Films
【摘要】 本文使用TEM分析、X射线衍射以及电导和霍耳效应联合测量等手段研究了Ar+激光结晶a-Si:H膜的结构和电学性质.结果表明a-Si:H液相激光结晶膜(LP-LCR)的平均晶粒尺寸达数十微米,呈<111>择优取向,室温电导率为1.5(Ω·cm)-1,电子霍耳迁移率达36cm2V-1s-1,是一种有应用前景的薄膜.
【Abstract】 The structural and electrical properties of crystallized a-Si:H films obtained by Ar+ la-ser scanning irradiation have been investigated by means of TEM, X-ray diffraction spectraand conductivity- Hall measurements.For the liquid phase laser crystallized films (LP-LCR),the results show that the average grain size is about tens of micrometers and the preferentialcrystal orientation is to the direction of <111>. At room temperature the conductivity of cry-tallized films is 1.5 (Ω·cm)-1 and the Hall mobility of electrons is about 36 cm2V-1S-1.The re-sults demonstrate that the LP-LCR films of a-Si:H are adequate for device application.
- 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1992年01期
- 【被引频次】1
- 【下载频次】23