【摘要】 多弧离子镀技术中的关键部件是蒸发源,蒸发源的电弧放电特性受磁场的严格控制。本文对真空电弧等离子体在磁场中的受力进行了分析,研究了磁场对电弧运动的影响规律。更多还原

【Abstract】 Evaporation sources are the key component in the multi-arc ion plating system. The arc-discharge fsature of the evaporation source is strictly controlled by a magnetic field. In thispaper, the effect of magnetic field on the vacuum arc plasma is aualyzed and the effectof magnetic field on 1he motion of arc is studied.更多还原