【摘要】 为模拟辐射效应,使用增强质子背散射、SEM、TEM和显微硬度等测量手段进一步研究了He离子注入HR-1型不锈钢中的行为。离子束能量和剂量区间分别为30～170keV和10¹⁵～10¹⁸He⁺/cm²,靶温区为77～673K,部分样品进行了升至1323K的恒时退火实验。研究了注入He的分布特征、起泡过程、He泡结构及He的释放特性。也测量了不同剂量下注He层显微硬度的变化。更多还原

【Abstract】 A further study of the behavior of the helium implanted into stainless steel type HR-1 (nearly similar to S. S. 316L) has been carried out by means of 2. 5 MeV enhanced proton backscattering, TEM, SEM and microhardness measurements, the ion energy and the dose ranges were 30-170 keV and 1015-1018 He+cm-2, respectively. The target temperature varied from 77 K to 637 K. Post-irradiation isochronical annealings up to 1323 K were performed for some samples. It is found that the He implanted at room temperature or below can be nearly 100% trapped in the steel for <c(c is the critical dose for surface blistering). The depth profiles are Gaussianlike. When >, surface blistering or flaking occur. The amount of retained He vibrates around a certain level with further increasing dose, and characteristic profiles with two maxima are observed. c is found to decrease with increasing temperature or reducing ion energy. A discussion on the evoluation of blisters from bubble linking and percolation at room temperature or bubble coalescence at elevated temperatures is also presented. During annealing He release occurs in two temperature regions, i. e. 400 -600Kand773-1273K. 70-80% of implanted He release in the high temperature stage, which is accompanied by forming blisters and flakes on surfaces. An activation energy of -1 eV for the first release stage has been estimated. Its comparison with the model calculations shows that the combined mechanism of He diffusion-the detrapping-retrapping processes or the so-called hindered interstitial migration-is responsible for this lower temperature release.更多还原