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蓝色铬膜层的电沉积机理
THE MECHANISM OF ELECTRODEPOSITION OF BLUE CHROMIUM FILM
【摘要】 本文通过对蓝色铬膜层的XPS分析及电化学方法研究了该膜层的沉积过程。结果表明,整个膜层可分为:120nm厚的交界层(主要成分是Cr和基底Ni),250nm厚的中间层(Cr2O3,Ct和CtSe,后者决定了膜层呈蓝色),以及100nm厚的表面层(吸附的Cr(Ⅵ)、Cr(Ⅲ),SeO42-和Se),对电沉积历程和机理进行了探讨。
【Abstract】 Blue chromium films prepared by cathodic electrodeposition on Ni substrate in a solutionof CrO3, H2SO4 and H2SeO4 have been studied by XPS and electrochemical measurement. Theresults indicated that the blue chromium films were made up of three layers, correspondingto the three steps in deposition: (1)The reduction of an oxide layer (NiOCrOH) to metallicNi and Cr, which made an inner layer of about 120nm in thickness. (2)The reduction ofCr(Ⅵ)and the depositions of Cr, Cr2O3 and CrSe, which formed a medium layer of about250nm. (3)The deposition and absorbtion of Cr(Ⅲ) and H2SO4 and its reduced products,which formed an outer layer of about 100nm.
【Key words】 blue chromium film; cathodic film; XPS; H2SeO4; CrO3; CrSe;
- 【文献出处】 应用化学 ,Chinese Journal of Applied Chemistry , 编辑部邮箱 ,1991年01期
- 【被引频次】2
- 【下载频次】45