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金属铜在100keVAr~+轰击下的溅射特性
SPUTTERING PROPERTIES OF COPPER TARGET BOMBARDED BY lOOkeV Ar~+
【摘要】 金属铜在100keVAr~+的垂直入射和40°以及70°入射角的倾斜入射下,溅射原子角分布有较大的变化。垂直入射时溅射原子角分布关于金属表面法线是对称的;40°和70°角倾斜入射时溅射原子角分布的对称线关于表面法线分别偏离了7°和-12°产生这一现象的微观机制在于倾斜入射时入射离子所产生的反冲原子级联是非线性的。
【Abstract】 when copper target is bombarded by 100keV Ar+ at the incident angles of 0° , 40° and 70° , the angular distributions of sputtering atoms change greatly and the angles between the surface normal of the copper target and the symmetry lines of the angular distributions of sputtering atoms are 0°, 7°and - 12°respectively .The mechanism of these phenomena is that the cascades of recoil atoms caused by the incident ions are nonlinear .
【关键词】 溅射;
溅射原子角分布;
线性级联;
【Key words】 sputtering; the angular distributions of sputtering atoms; linear cascade.;
【Key words】 sputtering; the angular distributions of sputtering atoms; linear cascade.;
- 【文献出处】 烟台师范学院学报(自然科学版) ,Yantai Normal University Journal(Natural Science) , 编辑部邮箱 ,1991年01期
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