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硅衬底上YBa₂Cu₃O_7-δ超导薄膜的制备

PREPARATION OF YBa₂ Cu₃O_7-δ THIN FILMS ON SILICON

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【Author】 Zhang Ruojian, Yang Senzu(Dept.of Information Physics, Nanjing University)Zhang Shiyuan, Zhang Hongcai (Dept.of Physics, Nanjing University)

【机构】南京大学信息物理系；南京大学物理系；南京大学物理系；

【摘要】叙述了采用DC磁控溅射方法直接在Si衬底上制备YBa₂Cu₃O_7-δ（YBCO）超导薄膜的过程;讨论了衬底温度、薄膜厚度和后处理工艺等因素的影响;研究了Si与YBCO膜之间互相扩散的情况。溅射时衬底温度630℃,后在480～500℃进行原位等离子体氧化,再缓慢降温至200℃。在Si（100）和Si（111）上得到的YBCO膜,其零电阻温度分别为63K和64K。更多还原

【Abstract】 Factors such, as substrate temperature, film thickness, post annealing conditions in the preparation of superconducting YBa2Cu3O7-δ (YBCO) thin film on silicon directly using DC magnetron sputtering were described.Interdiffusion between YBCO film and silicon substrate was researched.The films were deposited at 630℃ and plasma oxdized at 480-500℃, then cooled down slowly to 200℃.The films on single crystal Si(100) and Si(111) exhibit zero resistance at 63 K and 64 K respectively.更多还原