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光电器件介质薄膜电特性检测中的特殊问题及解决办法

Special Problems in Measuring the Electrical Characteristics of Dieletric Film in Photodevice and Solving Methods

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【作者】 朱洪亮; 瞿伟; 王圩;

【Author】 Zhu Hongliang;Qu Wei;Wang Wei Institute of Semiconductor, Academia Sinica, BeiJin, 100083

【机构】 中国科学院半导体研究所; 中国科学院半导体研究所 北京; 100083; 北京;

【摘要】 本文提出了InP系光电器件介质薄膜电特性检测中所遇到的两个特殊问题:管芯倒装在镀铟铜基座上测量时铟层凹陷致使介质薄层边缘短路;芯片解理条边缘金属须搭连产生短路。还介绍了问题的分析过程和解决办法。

【Abstract】 This paper presents two problems in measuring the electrical characteristics of dieletric film in Inp photo- device: the one was the short-circuit at the edge of dieletric film caused by In layer collapse as the flip chip on copper base In-plated was measured, the other was the short-circuit caused by connection of metal whiskers at the edge of cleavage strip of the chip. The analyses and solving methods for the problems are also introduced.

【关键词】 光电器件; 介质薄膜; 电特性;
【Key words】 Photoelectic device; Dieletric film; Electrical property;
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