节点文献
电子能谱二氧化硅标准物质的研制
DEVELOPMENT OF A STANDARD REFERENCE MATERIAL-SiO2 FOR AES AND XPS
【摘要】 本文主要阐述了标准物质SiO2的制备与研究以及用AES测定其界面宽度时的各种影响因素。文献综述了三种界面宽度的计算方法和修正因子,并指出了各自的优缺点。
【Abstract】 This paper describes the development of a standard reference material-SiO2 and different influence factors in the interface width measurement by AES. Three computing methods and correcting factors are summarized, and their merits and demerits are indicated, respectively.
- 【文献出处】 真空科学与技术 ,Vacuum Science and Technology , 编辑部邮箱 ,1990年06期
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