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碲氧溅射薄膜的光学性质

Optical Properties of Te-O Sputtering Thin Films

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【作者】 陆家福俞大渨方之耀

【Author】 Lu Jiafu Yu Daiwei Fang Ziyao (Shanghai Institute of Ceramics,Chinese Academy of Sciences)

【机构】 中国科学院上海硅酸盐研究所中国科学院上海硅酸盐研究所

【摘要】 碲氧薄膜是很有希望的可擦写光盘介质材料。本文用射频溅射技术制备碲氧系统的薄膜。测定热处理前后薄膜的光学特性(光透过率、反射率、折射指数、光吸收系数和光能隙)和 X 射线衍射特性,并研究了这些性能与靶材的组份关系,还测定了这些薄膜激光喇曼光谱,并讨论它们的结构特征。

【Abstract】 The Te-O thin film as a reversible optical recording medium is a very promi-sing material.In our laboratory,this film was prepared by rf-diode sputteringtechnique,the optical properties,such as trasmissivity,reflectance,absorption coef-ficient,optical gap,and the X-ray diffraction characteristics as well as the Ramanspectra of the film obtained were measured before and after heat treatment.Therelationship between the optical properties measured and the compositions of thesputtering targets used was studied,and the structural characteristics of the filmdiscussed.

  • 【文献出处】 无机材料学报 ,Journal of Inorganic Materials , 编辑部邮箱 ,1990年02期
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