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氧化钽感湿薄膜的研究
A Study of Tantalum Oxide Humidity Sensitive Thin Films
【摘要】 在Ar-O2混合气氛中采用直流磁控反应溅射沉积制得了氧化钽薄膜.文章介绍了沉积薄膜的实验装置与工艺,叙述了反应溅射的过程与机理.用AES、XPS和X射线衍射研究了薄膜的成分与结晶结构,用Ta2O5薄膜研制成Si-MOS薄膜湿敏器件.测试结果表明:这种新的湿敏器件具有高的灵敏度和非常快的响应速度.
【Abstract】 Tantalum oxide thin films were deposited by reactive DC magnetron Sputtering from a tantalum target in Ar-O2 mixture. Experimental apparatus and procedures for deposition of thin films ars described.The reactive sputtering processes and mechanism are given. Composition and crystalline structures of thin films were investigated by AES,XPS,and X-ray diffraction. The authos have developed Si-MOS thin film humidity sensitive devices using Ta2O5 thin film. Measurement results have shown that the new ices exhibits high sensitity and very fast humidity response speed.
【Key words】 Tantalum oxide thin film humidity sensitive device reactive sputtering;
- 【文献出处】 传感技术学报 ,Journal of Transcluction Technology , 编辑部邮箱 ,1990年01期
- 【被引频次】2
- 【下载频次】45