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硅-金刚石系统的离子束混合和欧姆接触
Ohmic Contacts Formed by Ion Mixing in Si-Diamond System
【摘要】 用离子束混合Si(700A)/C样品,在天然Ⅱb型金刚石上形成了梯度能带接触。选用Ge+为注入离子,在能量120keV,剂量2.0×1016cm-2,温度700℃下进行离子束混合。Rutherford背散射显示:有3—4%的Si与金刚石混合。红外吸收谱发现了Si—C键的形成,这表明形成了Si/SiC/C的梯度结构。Ⅰ—Ⅴ特性说明了离子束混合和高温热退火有助于欧姆接触的形成。而没有经过离子束混合的样品显示了Ⅰ—Ⅴ开路特性。
【Abstract】 Graded band-gap contacts to natural type IIb diamond were formed by ion beam mixingof Si(700A)/Diamond samples.Ion mixing was ca(?)ried out using 120 keV Ge+ ions at a doseof 2×1016cm-2 at temperature of 700℃. Rutherford backscattering spectra show that about3 to 4 percent of the Si layer was mixed into the diamond. Si-C bonds were observed byinfrared absorption measurements, indicating the formation of a Si/SiC/Diamond graded structure.Ⅰ-Ⅴ characteristics show that well behaved ohmic contacts can be formed by ion mixingwith a subsequent thermal annealing.Samples w(?)thout ion mixing show open circuit behavior.
- 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1990年06期
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