节点文献

硅-金刚石系统的离子束混合和欧姆接触

Ohmic Contacts Formed by Ion Mixing in Si-Diamond System

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 方芳S.S.Lau

【Author】 Fang Fang/Ion Beam Laboratory, Shanghai Institute of Metallurgy, Academia SimicaS. S. Lau/University of California, Son Diego, U. S. A.

【机构】 中国科学院上海冶金研究所离子束开放研究实验室美国加州大学圣地亚哥分校 上海

【摘要】 用离子束混合Si(700A)/C样品,在天然Ⅱb型金刚石上形成了梯度能带接触。选用Ge+为注入离子,在能量120keV,剂量2.0×1016cm-2,温度700℃下进行离子束混合。Rutherford背散射显示:有3—4%的Si与金刚石混合。红外吸收谱发现了Si—C键的形成,这表明形成了Si/SiC/C的梯度结构。Ⅰ—Ⅴ特性说明了离子束混合和高温热退火有助于欧姆接触的形成。而没有经过离子束混合的样品显示了Ⅰ—Ⅴ开路特性。

【Abstract】 Graded band-gap contacts to natural type IIb diamond were formed by ion beam mixingof Si(700A)/Diamond samples.Ion mixing was ca(?)ried out using 120 keV Ge+ ions at a doseof 2×1016cm-2 at temperature of 700℃. Rutherford backscattering spectra show that about3 to 4 percent of the Si layer was mixed into the diamond. Si-C bonds were observed byinfrared absorption measurements, indicating the formation of a Si/SiC/Diamond graded structure.Ⅰ-Ⅴ characteristics show that well behaved ohmic contacts can be formed by ion mixingwith a subsequent thermal annealing.Samples w(?)thout ion mixing show open circuit behavior.

【关键词】 离子束混合欧姆接触梯度能带
【Key words】 lon mixingohmic contactsgraded band-gap
  • 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1990年06期
  • 【下载频次】14
节点文献中: 

本文链接的文献网络图示:

本文的引文网络