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GaAs基片上制作优质衍射光栅的实时监测技术的分析

Analysis of In-situ Monitoring Technique for Fabrication of High Quality Diffraction Gratings on GaAs Substrate

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【Author】 XIE Jianping/Department of Physics, University of Science and Technology of China, Hefei,Annui ChinaMING Hai/Department of Physics, University of Science and Technology of China, Hefei,Annui ChinaKUNIO Tada/Department of Electronic Engineering, University of Tokyo,7-3-1 Hongo,Bunkyo-Ku 113, Japan

【机构】中国科技大学物理系；日本东京大学电子工程系合肥；合肥；

【摘要】在光刻胶显影中,实时检测衍射光的强度可在GaAs基片上制作高质量的光栅。本文着重分析这种实时监测技术中衍射光强随显影程度的变化规律,指出最佳显影终止点。分析与实验符合良好。更多还原

【Abstract】 In developing processing of photoresist, high quality diffraction grating can be fabricatedon GaAs substrate by in-situ monitoring the diffraction intensity from the photoresist.The diffractionintensity variation with development is analyzed,and the optimum end point of developingis indicated in this paper.The analyses are in good agreement with the experiment results.更多还原

【关键词】监测；光栅； GaAs；
【Key words】 Monitoring； grating； GaAs；

【文献出处】半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1990年02期

【被引频次】2
【下载频次】35

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