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用低能电子衍射研究GaAs(110)表面的弛豫
A STUDY OF GaAs(110) SURFACE RELAXATION WITH LOW-ENERGY-ELECTRON-DIFFRACTION
【摘要】 用低能电子衍射研究了GaAs(110)表面的弛豫。发现当理论与实验之间符合得最好时,得到的结构是,保持表面上As—Ga键长不变用一个27.32°±0.24°的旋转角(ω),使As原子向外移动0.10±0.02,Ga原子向内移动0.55±0.02,而从Ga到第二层时空间为d2=1.45±0.01,从第二层Ga到第三层的空间为d3=2.01±0.01。对此结构As的背键长lA5=2.43±0.01(收缩0.56%),而Ga的背键长lGa=2.253±0.004(收缩8.0%)。
【Abstract】 We have studied the surface relaxation of GaAs (110) with Low-Energy-Electron-Diffra-cion. We find that the best agreemet between theory and experiment is obtained for such a structure in which the As atoms are tilted outward by 0.10±0.02A and the Ga atoms are tilted inward by 0.55±0.02 A, with an angle of rotation (ω) of 27.32° ±0.24°, keeping the bond length at surface As-Ga unchanged and a Ga to secondlayer spcing d2= 1.45±0.01 A and the second-layer Ga to third-layer spcing d3 = 2.01±0.01 A. For this structure, the As back bond length lAS =2.43± 0.01 A (contracted 0.56%) and the Ga back bood length lGa = 2.235 ± 0.004A (contracted 8.0%)
- 【文献出处】 物理学报 ,Acta Physica Sinica , 编辑部邮箱 ,1989年03期
- 【被引频次】1
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