节点文献

用低能电子衍射研究GaAs(110)表面的弛豫

A STUDY OF GaAs(110) SURFACE RELAXATION WITH LOW-ENERGY-ELECTRON-DIFFRACTION

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 蓝田; 徐飞岳;

【Author】 LAN TIAN XU FEI-YUE(Depertmcnt of Micro-Electronics Technology and Electronic Materins, Chengdu Institute of Radio Engneering)

【机构】 成都电讯工程学院微电子技术与电子材料系; 成都电讯工程学院微电子技术与电子材料系;

【摘要】 用低能电子衍射研究了GaAs(110)表面的弛豫。发现当理论与实验之间符合得最好时,得到的结构是,保持表面上As—Ga键长不变用一个27.32°±0.24°的旋转角(ω),使As原子向外移动0.10±0.02,Ga原子向内移动0.55±0.02,而从Ga到第二层时空间为d2=1.45±0.01,从第二层Ga到第三层的空间为d3=2.01±0.01。对此结构As的背键长lA5=2.43±0.01(收缩0.56%),而Ga的背键长lGa=2.253±0.004(收缩8.0%)。

【Abstract】 We have studied the surface relaxation of GaAs (110) with Low-Energy-Electron-Diffra-cion. We find that the best agreemet between theory and experiment is obtained for such a structure in which the As atoms are tilted outward by 0.10±0.02A and the Ga atoms are tilted inward by 0.55±0.02 A, with an angle of rotation (ω) of 27.32° ±0.24°, keeping the bond length at surface As-Ga unchanged and a Ga to secondlayer spcing d2= 1.45±0.01 A and the second-layer Ga to third-layer spcing d3 = 2.01±0.01 A. For this structure, the As back bond length lAS =2.43± 0.01 A (contracted 0.56%) and the Ga back bood length lGa = 2.235 ± 0.004A (contracted 8.0%)

  • 【文献出处】 物理学报 ,Acta Physica Sinica , 编辑部邮箱 ,1989年03期
  • 【被引频次】1
  • 【下载频次】103
节点文献中: 

本文链接的文献网络图示:

本文的引文网络