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脉冲强流电子束的发射度测量

EMITTANCE MEASUREMENTS FOR PULSED INTENSE ELECTRON BEAMS

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【作者】 程念安

【Author】 Cheng Nianan China Academy of Engineering Physies

【机构】 中国工程物理研究院

【摘要】 本文描述了利用多孔板测量脉冲强流电子束发射度的原理和方法。考虑了空间电荷和轴向磁场对测量的影响。实验参量是阴极形状、阳极网孔、二极管距离和电压、电流幅值。在直线感应加速器上、用天鹅绒平面阴极和腐蚀的钨网阳极,当束能为1.32MeV、束流为2kA时,测得均方根发射度εrm=79cm.mrad,相应规一化亮度Bn=4.8×103A/(cm.rad)2

【Abstract】 The principle and method of emittance measurements for pulsed intense electron beams using a multipinhole pin mask is described in the article.The effects of space charge and axial magnitic field on the measurements were considered . The experimental parameters were cathode type , anode mask texture . diode spacing and voltage ,and beam current. A Em (rms value of the emittance) of 79 cm.mrad was obtained with a planar velvet cathode an etched tungsten mask anode at the beam energy (E) of 1.32 MeV and the beam current (I) of 2kA on the LIA, corresponding normalized brightness (B ) was 4.8 × 10 A (cm.rad ) .

【关键词】 发射度亮度
【Key words】 emittancebrightness.
  • 【文献出处】 强激光与粒子束 ,High Power Laser & Particle Beams , 编辑部邮箱 ,1989年03期
  • 【被引频次】6
  • 【下载频次】41
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