【摘要】 利用透射电镜和扫描电镜,观察了经磨损试验后的Al合金基体上的TiN镀膜形貌以及破坏形式,并从镀膜的表面和横截面研究了镀膜的组织结构、相分布和组织分布。观察发现,TiN镀膜的表层是由细小的微晶组成;而横截面上是细柱状TiN晶体,其间存在着没有贯穿整个镀膜的微裂纹。TiN镀膜通过AlTi₃化合物相过渡和基体Al合金结合。经磨损后的TiN镀层有片状剥落,存在大量和磨损方向平行或垂直的裂纹。镀膜层存在较大的内应力。分析认为微裂纹的存在影响镀膜的耐磨性,而内应力则导致了微裂纹的产生。讨论了微裂纹、内应力以及磨损性之间的联系,提出了改善镀膜性能的方法。更多还原

【Abstract】 With SEM and TEM, the morphology and microstructure of surface layer and cross-section of TiN film ion-plated on Al alloy substrate are studied. According to the observation, the TiN wearing film in surface layer consists of Polycrystals and of thin columnar crystals in cross-section. There are many microcracks among the columnar crystals, but they are not throughout the surface of film. There is an AlTi₃ transitive zone between TiN film and Al alloy substrate. TiN film peels in flakes and a lot of cracks parallel to or perpendicular to the wearing direction can be observed through the wearing test. A large stress is measured in TiN film. Based on the observed results, it is considered the microcracksin TiN film affect the wear-re sistance and the stress induces the microcracks. The relation of stress, microcracks and wear-resistance has been discussed. The method for enhancing the film properties is given.更多还原