【摘要】 四种有机硅单体,即乙烯基三甲基硅烷（VTMS）、乙烯基甲基二乙基硅烷（VMDES）、八甲基环四硅氧烷（D₄）和六甲基二硅氧烷（M₂）,在13.56MHz钟罩式等离子体发生器中,分别进行等离子体聚合,聚合物沉积在多孔聚丙烯底膜celgard 3401表面。在放电功率50W,体系压力12—30Pa,反应时间15—60min时,形成具有氧氮选择透过功能的有机硅等离子体聚合物复含膜。其氧气透过速率Jo₂是12.7—5.7×10^-66Cm³（STP）/cm²·s:cmHg,氧氮分离系数αO/N是3.78—4.07。等离子体聚合物层的厚度约0.1—0.2μm。根据它们的扫描电镜照片、红外光谱和元素分析数据,讨论了具有气体选择透过性能的等离子体聚合物复合膜的形反过程;底膜性质对复合膜性能的影响;等离子休聚合物层的化学结构和组成,以及它们同复杂等离子体聚合反应历程之间的关系更多还原

【Abstract】 The vinyltrimethylsilane (VTMS) , vinylmethyldiethylsilane (VMDES) , cyclooctamethylsiloxane(D4) and hexmethylsiloxane (M2) were polymerized, respectively, by glow discharge at 13:56 MHz bell jar Type plasma reactor.The polymers formed were deposited on the subtrater polypropylene porous film Celgard 3401.Under the conditions of discharge power SOW, system pressures 12-30 Pa and reaction time 15-60 min., the organcsilicon plasma polymer composite membranes with oxygen-nitrogen selective permeability were formed. Their oxygen permeable rate is 2.7-5.7×10-6cm3 (STP) /cm2 . s . cmHg, the oxygen-nitrogen separation coefficient αO/N is 3.76-4.07. The thickness of plasma polymer layer is about 0.1-0.2μm.By means of SEM, IR and element analysis, the formation process of plasma polymer composite membranes, the influence of substrate upon gas selective permeability membranes and the dependence of chemical structure of plasma polymer layer on complex mechanisms of plasma polymerization were discussed.更多还原