【摘要】 <正> The refratory silicides are of interest as contact and interconnect materials for VLSI to improve the characteristics of devices because of their low and metal- like resistivities and their high temperature stability. Jn this paper, we report the electrical properties of WSix films. The sample was formed by multilayer sputtering with W DC target and Si magnetron target onto a rotated n-Si(111) substrate and was subsequently更多还原