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化学气相沉积耐磨涂层TiN的温度选择

Selection of Temperature for Chemical Vapor Deposition of Wear-Resistance TiN Films

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【作者】 张林荣张福林

【Author】 Zhang Linrong Zhang Fulin

【机构】 北京科技大学稀冶物化教研室北京科技大学稀冶物化教研室

【摘要】 化学气相沉积(CVD)TiN涂层在模具上涂复3~10μm可使模具寿命提高3~4倍。本文研究指出:沉积温度对沉积速率、涂层硬度及对基体Cr12MoV硬度和尺寸都有影响。在950~1000℃间可以得到接近化学计量的TiN,其硬度Hv(1)≈20000N/mm~2,基体尺寸变化在万分之五以内。

【Abstract】 The effects of the deposition temperature on the chemical vapor deposition (CVD) rate, the bulk hardness value of TiN deposite and the hardness and the dimension of the steel base were investigated. TiN film obtained at temperatures between 950 and 1000℃, were stoichiometric composition, golden-yellow in color, and the high hardness (Hv1≈2000N/mm2). The hardness and dimension of the steel base depend on the deposition temperature. The variety of dimension for the steel base is less than 0.0005 if it is tempered after deposition.

【关键词】 涂层模具CVDTiN
【Key words】 coatingdieTiN filmCVD
  • 【文献出处】 北京科技大学学报 ,Journal of University of Science and Technology Beijing , 编辑部邮箱 ,1989年01期
  • 【被引频次】2
  • 【下载频次】55
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