节点文献
退火气氛中痕量氧在反应形成Pt硅化物中的作用
Effects of Trace Oxygen in Annealing Ambient on Formation of Pt Silicide
【摘要】 利用X-射线衍射,XPS和AES技术深入地研究了退火气氛中氧对Pt硅化物薄膜的固相成分的影响,发现痕量氧引起硅和铂(Pt)的不完全反应.为了形成单相的PtSi膜,在退火过程中防止氧的沾污是非常重要的.
【Abstract】 The effects of trace oxygen in inert gases used in furnace annealing process on the solidphase composition of platinum silicide thin films have been extensively investigated by usingX-ray diffraction,XPS and AES techniques.It was found that the oxygen contamination dur-ing annealing causes the incomplete reaction of Pt and Si.In order to form single phase PtSifilms it is very important to prevent the contaminations induced by trace oxygen during an-nealing process.
- 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1989年08期
- 【被引频次】5
- 【下载频次】16