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Si/a-Si:H异质结微波双极型晶体管实验研究

Experimental Study on a Si/a-Si:H Heterojunction Microwave Bipolar Transistor

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【作者】 王因生盛文伟汪建元张晓明熊承堃朱恩均

【Author】 Wang Yinsheng/Nanjing Electronic Devices Institute,Nanjing Sheng Wenwei/Nanjing Electronic Devices Institute,Nanjing Wang Jianyuan/Nanjing Electronic Devices Institute,Nanjing Zhang Xiaoming/Nanjing Electronic Devices Institute,Nanjing Xiong Chengkun/Nanjing Electronic Devices Institute,Nanjing Zhu Enjun/Institute of Microelectronics, Beijing University, Beijing

【机构】 南京电子器件研究所北京大学微电子研究所 南京南京北京

【摘要】 本文首次报道采用重掺杂的氢化非晶硅(n+a-Si∶H)作发射极的硅微波双极型晶体管的制备和特性.该器件内基区方块电阻2kΩ/□,基区宽度0.1μm,共发射极最大电流增益21(VcB=6V,Ic=15mA),发射极Gummel数GB值已达1.4×1014Scm-4.由S参数测得电流增益截止频率fs=5.5GHz,最大振荡频率fmax=7.5GHz.在迄今有关Si/a-Si HBT的报道中,这是首次报道可工作于微波领域里的非晶硅发射极异质结晶体管.

【Abstract】 This paper reports for the first time the fabrication and the characteristics of a silicon he-terojunction microwave bipolar transistor with an n+ a-Si: H emitter.The base sheet resistanceof this device is 2 kΩ/□for 0.1μm base width. The maximum current gain is measured to be 21(Vcx=6V,Ic=15mA).The emitter Gummel number Gx of this device is obtained up to 1.4×1014Scm-4. From the measured S-parameters,5.5 GHz cutoff frequency ft and 7.5 GHz ma-ximum oscillating frequency fmax are obtained.This is the first reported amorphous heterojunc-tion bipolar transistor available in the microwave band up to now.

  • 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1989年06期
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