【摘要】 本文提出一种精密确定场发射尖端附近电位分布的新方法——逐次放大逼近模拟法。对一实际场发射系统,一方面实测了场发射电流;另一方面则用该法对系统的电位分布,进行了四次放大逼近模拟测量。并由此计算出尖端的电流密度分布、发射面积和发射总电流。将两电流进行比较,结果是一致的。表明:用这种方法精密确定尖端场分布,特别是测定不规则表面的场分布是方便有效的。更多还原

【Abstract】 A new method, the simulation method of gradual magnification, was proposed. It Can be used to measuare potential distribution around a field emisson tip. The field emission current of a real field emission system was measured The potential distribution of the system was also measured by using the simulation method of four times magnification, and so the distribution of the current density around the tip, the total current and the emission area were calculated. A comparison of the currents measured and calculated showed little defference so that it can be said that the proecise determination of the distribution of the field on an irregular surface of a tip.更多还原