【摘要】 利用透射电子显微镜,采用横截面电镜样品,对Ni基体磁控溅射离子镀(MSIP)A1膜的组织结构进行了分析研究。观察到了球状、柱状、块状三层次镀Al膜的组织形态,并在Ni基体和镀A1膜交界处发现了一个Al—Ni合金系中迄今未见报道的未知相,由电子衍射和透射能谱(EDX)分析其为体心四方点阵,a=b=5.88A,c=4.80A,是一富Al相。依据观察结果和离子镀技术的特点,对磁控溅射离子镀Al膜的形成机理进行了探讨。更多还原

【Abstract】 With the cross-section samples, the microstructures of the magnetron sputtering ion-plating(MSIP) A1 films on Ni substrate have been studied by TEM. The film that consists of the three layers of the microstructures-globular, columnar, massive-has been observed.An unknown phase in Al-Ni system is also found at the interface between Al film and Ni substrate. By electron diffraction and EDX analysis, it is identified that the phase is body centered tetragonal with the lattice constants a=b=5.88A, c=4.80A, and is rich in Aluminium. Based on the observed results and the character of the MSIP technique the forming mechanism of A1 film made by MSIP is discussed.更多还原