节点文献
光电子统计法研究点图象光电成像过程及器件特性
A Study of Characteristics of Spot Targets Photo-Electron Image Using Photoelectron Statistics
【摘要】 本文首次提出用统计法研究光电成像过程及各环节特性,建立了光电成像过程的统计极限探测方程,定量讨论了光电成像器件对这类图象的极限探测能力,并讨论了结果。
【Abstract】 In the paper, the process of photo-electronic image and its characteristics are studied with the statistical method for the fist time, and the equation for its limiting detection capability is established. The limiting detection capability to spot targets of the imaging devices is also discussed and compared quantitatively.
- 【文献出处】 量子电子学 ,Chinese Journal of Quantum Electronics , 编辑部邮箱 ,1988年02期
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