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Au/Si体系离子束混合层的透射电镜研究
TEM investigation of ion beam mixed Au/Si bilayer
【摘要】 用剖面制样技术对在150K、293K、373K温度下Ar离子束混合的Au/Si界面层进行了透射电镜研究,获得不同深度的一些结构细节。
【Abstract】 A cross section electron microscopy was used to reexamine the structure of ion beam mixed Au/Si bilayers. The mixing was carried out with 150-300 keV Ar ion beams for dose (2-5.6)× 106/cm2. Target temperature ranged from 150 to 373K. Some information on the fine structure at interfacial layers were obtained.
- 【文献出处】 核技术 ,Nuclear Techniques , 编辑部邮箱 ,1988年03期
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