节点文献
用于双极型工艺认证的微电子测试图形研究
Investigation of Microelectronic Test Pattern for Evaluating Bipolar Process
【摘要】 本文提出一种用于科学地评价双极型半导体器件(npn或pnp晶体管)工艺水平的微电子测试图形。该测试图形由物理分析及工艺参数测试结构、器件参数测试结构等部分组成,测试结构的探脚采用阵列式引出,适合2×N探卡进行探测。多数测试结构能用我们研制的微电子测试图形参数自动测试仪进行及数据处理。文中还给出利用本测试图形对工厂生产线工艺水平进行评估的实例。
【Abstract】 A microelectronic test pattern for evaluating bipolar devices (npn or pnp transistors) is presented. The pattern consists of three structures, which are physies analysis, process parameter test and device parameter test. Pads of three structures are arranged in matrix form so that 2×N probe-board can be used. Most of these structures can be measured and analysed with our home-made auto-apparatus. Some examples are given to show how to use this pattern to evaluate process in factory.
- 【文献出处】 华东师范大学学报(自然科学版) ,Journal of East China Normal University(Natural Science) , 编辑部邮箱 ,1988年03期
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