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掺杂和未掺杂LEC GaAs中EL2和位错密度分布

Distributions of EL2 Concentration and Dislocation Density in Si-doped and Undoped LEC GaAs

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【作者】 杨瑞霞; 刘文杰; 李光平; 华庆恒;

【Author】 Yang Ruixia, Liu Wenjie (Hebei Institute of Technology) Li Guangping, Hua Qingheng (Tianjin Electronic Materials Research Institute)

【机构】 河北工学院; 天津电子材料研究所; 天津电子材料研究所;

【摘要】 测量比较了掺Si和未掺杂LEC GaAs晶锭不同部位EL2浓度和位错密度分布。结果表明,掺Si样品中EL2浓度径向分布和位错密度径向分布分别为M形和W形,而未掺杂样品中两者均为W形。讨论了两者间不同对应关系的机理。

【Abstract】 We measure and compare the radial distributions of EL2 concentration and dislocation density in Si-doped and undoped LEC GaAs crystals. The results indicate that the radial distributions of EL2 concentration are W-shaped and M-shaped in undoped and Si-doped specimens, respectively, while the distributions of dislocation density are W-shaped in both undoped and Si-doped specimens. The correlations between the distributions of EL2 concentration and dislocation density in Si-doped and undoped specimens are discussed.

  • 【文献出处】 固体电子学研究与进展 ,Research & Progress of Solid State Electronics , 编辑部邮箱 ,1988年03期
  • 【被引频次】2
  • 【下载频次】33
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