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N2/H2比对化学气相沉积氮化钛涂层的影响

Influence of Different N2/H2 Ratios by Chemical Vapor Deposition on the Performance of TiN Films

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【作者】 张林荣; 张福林;

【Author】 Zhang Linrong, Zhang Fulin

【机构】 北京钢铁学院稀有教研室; 北京钢铁学院稀有教研室;

【摘要】 本文研究了N2/H2比对氮化钛涂层的晶格常数、硬度、沉积速率的影响,在N2/H2≈1/2时得到组成近似于化学计量的氮化钛,涂层硬度和沉积速率最高,涂层模具的寿命比不涂层的可提高4倍。

【Abstract】 Titanium nitride can be coated on the steel-base and cemented-carbides to improve the resistant to wear and corrosion.The effect of different N2/H2 ratios on the lattice parameter, hardness and the rate of the TiN deposition are researched in this paper. The results show that when optimum N2/H2 ratio appriximates to 0.5, the stoichiometric TiN will be formed. The hardness and the deposition rate of TiN film reach their maximum, and the lifetime of the treated surface increases by three times as compared with that of untreated ones.

【关键词】 化学汽相沉积; 氮化钛; 涂层; 模具;
【Key words】 chemical vapor deposition; titanium nitride; dies; coat;
  • 【被引频次】1
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