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溅射沉积InP薄膜的研究
RF SPUTTERING OF InP FILMS
【摘要】 本文报道了以射频溅射仪溅射沉积非晶态InP薄膜.并用X光衍射法、反射电子衍射怯、扫描电镜、红外分光光度计及俄歇能谱仪等研究了薄膜结构、貌相、组分及吸收边光谱等.并与富In的InP多晶薄膜作比较.
【Abstract】 The present paper is a report on the deposition of InP films on different substrates by sputtering. Using SEM, AES, X-ray diffractions, RED and infrared spectrophotometer, we have studied the topography, composition, crystal orientation, absorption edge spectrum etc.
- 【文献出处】 应用科学学报 ,Journal of Applied Sciences , 编辑部邮箱 ,1987年01期
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