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吸附伏安法测定合金铸铁中痕量钒

Adsorption Voltammetry Determination of Trace Amounts of Vanadium in Cast Alloy Iron

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【作者】 王丽增陈荣礼温世祺

【Author】 Wang Lizeng Chen Rongli Wen Shiqi (Dept.of Chemistry,Shandong University)

【机构】 山东大学化学系山东大学化学系

【摘要】 <正>钒在不同底液中的极谱特性由Ligán等作了较详细的研究;钒(V)的极谱催化波曾由高小霞、李南强等作了深入的研究莫茂生用单扫示波极谱,研究了钒(V)—Hcup在HAc—NáAe底液中的示波导数极谱行为,所得线性范围为2x10-5~8×10-8M;我们用79—1型伏安分析仪研究钒(V)—Hcup配合物在悬汞电极上吸附富集后的伏安特性,发现在0.4M NH4Cl pH

【Abstract】 In the 0.4M NH4Cl(pH,4.8) suporting electoiyte containing cupferron, a sensitive adsorptive complex wave of vanadium( Ⅴ )-cupferron complex has been obtained by using linear potential sweep voltam metry. The reduction peak of the complex was at -0.73V( vs.SCE) .The height of the derivative peak was proportional to the pre-concentration time,y2(scan rate) and the concentration of vanadium (Ⅴ) in the range of 6.0×10-10 -4.0×10-8M.The limit of the determination was 20ppt. Optimal conditions for the determination of trace amounts of vanadium (Ⅴ) in cast alloy iron were suggested.

  • 【文献出处】 冶金分析 ,Metallurgical Analysis , 编辑部邮箱 ,1987年01期
  • 【被引频次】2
  • 【下载频次】14
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