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Ag—Cu电解膜微孔沉积物的形态和成分分析
Form and Composition analysis of Ag-Cu Electrolysis Film Tiny Hole Deposit
【摘要】 本文使用x 射线光电子能谱(ESCA)测定得自Ag—Cu 电解质的阳极氧化电解着色膜,确定其微孔沉积物为金属银和金属铜,并用原子吸收分光光度法对膜的成分和含量进行了测定,根据得到的Ag%~t 曲线、Cu%~t 曲线和Ag—Cu 电解膜的色度,获得电解时间的最佳值t=3。
【Abstract】 The research on anodizing electrolysis colour film obtained from Ag-Cuelectrolyte with ESCA is dealt with in this paper.As a result,the tiny hole deposithas been found to be metal Ag/Cu.Determination of the percentage of the compositefilm with an Atomic Absorption Spectrometry is also mentioned here.On the basisof Ag%—t curve and Cu%—t curve along with colority of Ag-Cu electrolysis time,t=3″is obtained.
【基金】 84年教育部部属高校重点项目
- 【文献出处】 上海交通大学学报 ,Journal of Shanghai Jiaotong University , 编辑部邮箱 ,1987年02期
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