节点文献
化学蒸汽淀积簿膜工艺中复相体系的热力学计算
Thermodynamical Study of Heterogeneous System in Chemical Vapor Depositiou Film Technique
【摘要】 本文就当前半导体工业中一些常规CVD薄膜工艺的热力学研究作了讨论,给出了运用热力学计算的方法分析这些常规工艺的应用实例。对计算中碰到的如多固体的处理、独立组分的选择等问题进行了讨论和归纳,列出了解决这些问题的几点参考建议。
【Abstract】 previous thermodynamical study of conventional CVD film techniquesis summed up. Some of calculated diagrams are drawn as example ofthermodynamical calculation applied in CVD technology. The problemsencountered in calculation, such as the handling of many solid statephases in solid products and the choice of independent components, arediscussed. Some referential suggestions are given.
- 【文献出处】 计算机与应用化学 ,Computers and Applied Chemistry , 编辑部邮箱 ,1987年04期
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