【摘要】 本文介绍了用激光投影系统汽化C_r板的技术。可在C_r板上汽化出3μm×3μm至80μm×80μm的矩形方孔,最细线宽1μm的线条,最小直径φ1.5μm的园形孔。汽化质量已达到修正LSI掩模缺陷的使用要求。讨论了汽化质量与激光参数的关系。更多还原

【Abstract】 This paper reports a techique of evaporating films of Cr,using laser projected system.Experiment has evaporated rectangular hols 3μm×3μm to 80μm×80μm lines minimum width 1μm,circles minimum diameter φ1.5μm.The quality of-evaporated holes has attainted the criterion for repair defect of LSI photomasks.We have discussed the dependence of the dimension and quality of the evaporated holes on the laser parameters.更多还原