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背散射法测定低能氩离子对金的溅射率
Measurement of Au sputtering yield with low energy Ar ion by backscattering
【摘要】 本文用背散射方法测定了300—1200eV不同能量的氩离子对金的溅射率。实验测得的背散射能谱用两种不同的方法(能量损失和面积法)处理,结果表明,用背散射法测得金的溅射率与G.K.Wehner用称重法测定的数据很接近,其与入射离子能量的关系为Y∝E0.4。
【Abstract】 Au sputtering yield with Ar+ ions of 300-1200 eV is measured by backscattering. The backscattering spectra are treated by two methods(energy loss method and area method). The results show that Au sputtering yield measured by RBS is in agreement with G. K, Wehner’s result by weight method. The relation between our experimental sputtering yield and ion energy is y∝E0.4. This energy relation gives a good agreement with P. Sigmund’s theory when m = 0.3.
- 【文献出处】 核技术 ,Nuclear Techniques , 编辑部邮箱 ,1987年09期
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