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背散射法测定低能氩离子对金的溅射率

Measurement of Au sputtering yield with low energy Ar ion by backscattering

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【作者】 明嘉增陈国明周祖尧任琮欣杨絜傅新定朱德彰曹德新

【Author】 Hu Jiazeng Chen Guoming Zhou ZuyaoRen Congxin Yang Jie Fu Xinding (Shanghai Institute of Metallurgy, Academia Sinica)Zhu Dezhang Cao Dexin (Shanghai Institute of Nuclear Research. Acadernia Sinica)

【机构】 中国科学院上海冶金研究所中国科学院上海原子核研究所中国科学院上海原子核研究所

【摘要】 本文用背散射方法测定了300—1200eV不同能量的氩离子对金的溅射率。实验测得的背散射能谱用两种不同的方法(能量损失和面积法)处理,结果表明,用背散射法测得金的溅射率与G.K.Wehner用称重法测定的数据很接近,其与入射离子能量的关系为Y∝E0.4

【Abstract】 Au sputtering yield with Ar+ ions of 300-1200 eV is measured by backscattering. The backscattering spectra are treated by two methods(energy loss method and area method). The results show that Au sputtering yield measured by RBS is in agreement with G. K, Wehner’s result by weight method. The relation between our experimental sputtering yield and ion energy is y∝E0.4. This energy relation gives a good agreement with P. Sigmund’s theory when m = 0.3.

【关键词】 背散射低能溅射率
【Key words】 backscattering low energy sputtering yield
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