【摘要】 本文介绍沟道-背散射分析的实验装置。用沟道-背散射方法进行了辐射损伤测定、表面组分分析、异质外延层的缺陷分析,得到了一些对半导体材料工艺、集成电路研制的有意义的结果。更多还原

【Abstract】 An experimental installation of channeling backscattering is described. Using channel backscattering method, study on the measurement of radiation defect, analysis of surface components, and analysis of the defect of foreign bosy extensional layer are carried out, and have achieved some results meaning full to semiconductor material technology and integrated circuit.更多还原