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两层介质减反膜及其在半导体光电器件中的应用

A two-layer dielectric AR film and its application in semiconductor opto -electrical devices

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【作者】 黄德修刘德明樊承鈞

【Author】 HUANG DEXIU, LIU DEMING AND FAN CHENGJUN (Huazhong University of Science & Technology)

【机构】 华中工学院光学系华中工学院光学系

【摘要】 本文提出了两层介质减反膜的膜系设计方法,导出了用于半导体激光放大器的最佳减反膜系参数,分析了膜层厚度误差对膜系特性的影响,并在行波半导体激光放大器及光探测器上得到了满意的试验结果。

【Abstract】 This paper gives a theoretical study on the design method of the anti-reflection (AR) film for traveling wave semiconductor laser amplifiers (TWSLA). A two-dimensional digital integration is used to calculate the optimum film parameters and their allowable errors for TiO2/SiO2 AR film coated on the facets of the 1.3μ InGaAsP lasers. Such films are successfully fabricated by using the vacuum coating and two-wavelen th control technique. The reflectivity of the is lower than 3.9×10-4. By means of the AR film, we succeeded in achieving the direct amplification for the optical signal and in increasing the sensitivities of PIN & APD detectors.

  • 【文献出处】 光学学报 ,Acta Optica Sinica , 编辑部邮箱 ,1987年11期
  • 【被引频次】10
  • 【下载频次】126
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