节点文献
六甲基二硅氮烷和八甲基环四硅氧烷的等离子体聚合
PLASMA POLYMERIZATION HEXAMETHYLDISILAZANE AND OCTAMETHYLCYCLOTETRASILOXANE
【摘要】 在外部电极电容耦合的辉光放电中进行了六甲基二硅氮烷和八甲基环四硅氧烷的等离子体聚合,考察了压力、功率以及等离子气体对聚合速率的影响。用红外光谱、X—射线衍射和溶解度等方法研究了聚合物的结构,并研究了聚合物的热稳定性、耐溶剂性和疏水性,测定了聚合膜的密度和折射率。
【Abstract】 In a capacitively coupled discharge with external electrodes, hexamet-hyldisilazane and octamethylcyclotetrasiloxane were polymerized, and the effects of sys-tem pressure, discharge power and plasma gas on the polymerization rate were studied.The polymer structure was researched tbrough IR spectroscopy, X-ray diffraction andsolubility measurements, and some properties of the polymer such as thermostability.solvent resistence, hydrophobicity, density and refrection index were also determined.
【关键词】 六甲基二硅氮烷的等离子体聚合;
聚六甲基二硅氮烷膜的接触角;
八甲基环四硅氧烷的等离子体聚合;
聚八甲基环四硅氧烷膜的接触角;
【Key words】 Plasma polymerization of hexamethyldisilazane; Contact angle of Plasma-polymerized hexamethyldisilazane film; Plasma polymerization of octamethylcyclotetrasiloxane; Contact angle of Plasma-polymerized octamethylcyclotetrasiloxane film;
【Key words】 Plasma polymerization of hexamethyldisilazane; Contact angle of Plasma-polymerized hexamethyldisilazane film; Plasma polymerization of octamethylcyclotetrasiloxane; Contact angle of Plasma-polymerized octamethylcyclotetrasiloxane film;
- 【文献出处】 辐射研究与辐射工艺学报 ,Journal of Radiation Research and Radiation Processing , 编辑部邮箱 ,1987年01期
- 【被引频次】6
- 【下载频次】131