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在700℃下液相外延生长的GaAs、AlxGa1-xAs中镁的掺杂特性

Properties of Mg Doped GaAs and AlxGa1-x As Grown by LPE at 700℃

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【作者】 刘宏勋章蓓王舒民虞丽生王维义逄明雪赵阳

【Author】 Liu Hongxun/Department of Physics, Peking UniversityZhang Pei/Department of Physics, Peking UniversityWang Shumin/Department of Physics, Peking UniversityYu Lisheng/Department of Physics, Peking UniversityWang Weiyi/Department of Physics, Peking UniversityPang Mingxue/Department of Physics, Peking UniversityZhao Yang/Department of Physics, Peking University

【机构】 北京大学物理系北京大学物理系

【摘要】 本文报告在700℃下液相外延生长的GaAs,AlxGa1-xAs的镁掺杂特性.测量了母液中不同镁的原子比与外延生长的CaAs,Al0.53Ga0.47As的空穴浓度的关系,掺镁GaAs的空穴浓度与其迁移率的关系以及在77—300K温度范围内空穴浓度、迁移率与温度的关系.估算了700℃下镁在GaAs中的分配系数.

【Abstract】 Properties of Mg doped GaAs,AlxGa1-xAs grown by LPE at 700℃ are investigated. Thehole concentration and mobility of Mg doped GaAs, Al0.53Ga0.47 As have been measured inthe temperature range of 77-300 K.The dependence of hole concentration on the compositionof Mg in liquid is obtained and the distribution coefficient of Mg in GaAs at 700℃ is estimated.

  • 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1987年02期
  • 【被引频次】2
  • 【下载频次】19
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