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平面磁控溅射ZnO压电膜的厚度分布
Thickness Distribution of ZnO Piezoelectric Films by Planar Magnetron Sputtering
【摘要】 从纽森(Knudsen)余弦定律出发,根据平面磁控溅射ZnO膜时靶的刻蚀特征,用盘形源和环形源的组合来描述这种条件下的膜厚分布,首先提出了将余弦定律应用于平面磁控溅射ZnO膜厚度分布的修正模型,实验结果与理论计算值吻合得较好。
【Abstract】 Thickness distribution of ZnO films prepared by planar magnetron sputtering is described by means of the combination of disk and ring sources based on etching properties of the target during sputtering from the point of view of Knudsen’s Cosine Law. A modified model of thickness distribution of ZnO films utilizing Cosine Law is first proposed in this paper. The theoretical and experimental results are formed to be in considerably good agreement with each other.
- 【文献出处】 压电与声光 ,Piezoelectrics & Acoustooptics , 编辑部邮箱 ,1986年06期
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