【摘要】 本文提出一个利用椭偏光谱测量复数折射率薄膜的方法。由于引入一个新的目标函数,把搜索的参量空间的维数减至四维,因此不但可以测得薄膜的光学常数和厚度,并且可同时确定衬底的光学常数。我们应用这个方法对射频溅射在硅衬底上生长的ITO膜光学常数的色散和生长规律进行了初步研究,发现硅衬底的表观光学常数也发生了变化更多还原

【Abstract】 In this paper, we propose a method which make it possible to investigate the films with complex refraction index using spectroscopic ellipsometry. By introducing a new aiming function, the search parameters space can be reduced to 4-dimension, so we not only can calculate the optical constant and the thickness of the films, but also the optical constant of the substrate simultaneously. Using this method, we studied the optieal constant dispersion and the growth rate of ITO films which is deposited on Si substrate by sputtering. At the same time, we observed that the apparent optical constants of the Si substrate were changed.更多还原