【摘要】 本文应用X射线衍射分析和电子衍射分析研究了A3钢基体磁控溅射离子镀铝膜的相组成。结果表明,膜的相组成主要是基板负偏压决定的。当基板负偏压低于300V时磁控溅射离子镀铝膜是单质铝膜;当基板负偏压为500V时镀膜中心出现了Al₁₃Fe₄相;随着基板负偏压增加,膜中相继出现了Al₅Fe₂、AlFe和AlFe₃等含铁量高的Fe-Al化合物相。更多还原

【Abstract】 The phases of the magnetron sputtering ion plating aluminum film on the A3 steel substrate have been examined by means of X-ray diffraction analysis and TEM. The results showed that the phases of the film are mainly dependent on the negative bi（?）s of the substrate. When the negative biases are lower than 300 volts, the film is purely made of the element of the target, aluminum. When the negative bias of 500 volts is applied to the substrate, only one phase, Al₁₃Fe₄, is found in the film. With the increase of the voltage of negative bias, the phases rich in Fe, Al₅Fe₂, AlFe and AlFe₃would be appeared successively in the film.更多还原