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As离子束混合形成硅化钨的卢瑟福背散射分析
An investigation of the tungsten silicide formed by As ion beam mixing with Rutherford backscattering
【摘要】 本工作用卢瑟福背散射研究了离子束混合方法形成硅化钨的条件。通过对热烧结和离子束混合法的比较,结合X射线衍射分析相结构的结果,指出离子束混合法可降低形成二硅化钨所需的退火温度。观察到氧杂质对形成条件的影响,简单讨论了离子束混合形成硅化物的机理。
【Abstract】 The conditions of forming tungsten silicide with As ion beam mixing have been studied by means of Rutherford backscattering. The comparison between sintering and ion beam mixing has been performed. The phases have been also identified by X-ray diffraction. The results demonstrated that the refractory metal silicide may be formed at a Teduced reaction temperature using ion beam mixing, technique. The effect of oxygen impurity on silicide formation has been observed. Finally, the mechanism on the formation of the silicide by ion beam mixing is simply discussed.
【关键词】 离子束混合;
难熔金属硅化物;
热烧结;
卢瑟福背散射;
【Key words】 ion beam mixing refractory metal silicide sintering Rutherford backscattering;
【Key words】 ion beam mixing refractory metal silicide sintering Rutherford backscattering;
- 【文献出处】 核技术 ,Nuclear Techniques , 编辑部邮箱 ,1986年05期
- 【被引频次】3
- 【下载频次】63