【摘要】 本文从瑞利一索末菲衍射公式出发,对接近式光刻机曝光系统进行理论分析和计算,得出其光学性能参数。同时给出依据这些参数所设计的系统所得的结果。更多还原

【Abstract】 The theoretical analysis and compulation relevant to the exposure system of the close-up photolithographic equipment are performed in line of Reyleigh-Sumerfei diff- raction formula,the parameter dealing with optical properties being obtained,mean- while the result gained from the system desigried in accordance with these parameters is given.更多还原