【摘要】 本文研究了用四氟化碳-氧等离子体进行干法显影的电子束刻蚀技术。负型电子束抗蚀剂是由聚环己烯砜和2,6-双-（4′-叠氮苯亚甲基）-4-甲基环己酮组成,其灵敏度为1.5×10^-5C/cm²,分辨率小于1μm,反差约1.43。并讨论了干法显影的影响因素和机理。更多还原

【Abstract】 A dry developing electron beam resist was investigated. As a negative resist, it consists of PCHS (polycyclohexene sulfone) and diazide (2,6-di-(4’-azidobenzal)-4-methy-lcyclohexanone). It was found that PCHS-diazide resist has a sensitivity of 1.5×10-5 C/cm2, a resolution of less than 1 μm and the contrast of about 1.43. The mechanism and the influence factor of dry development were discussed.更多还原